Nano-engineered surfaces enable the materials of the future.

A Global Leader in Surface Engineering Technology

Previously known as PneumatiCoat Technologies, Forge Nano is a global leader in surface engineering and precision nano-coatings. We specialize in making product improvements through the use of nano-technology. We turn laboratory innovations into affordable products with turnaround times never before seen.

With Forge Nano’s proprietary high-throughput manufacturing processes, precision nano-coatings are now a more accessible solution for applications from Lithium Ion batteries to a wide range of materials — powders, flats and objects — at price points unthinkable until now.

High Performance, High Throughput, Low Cost.

With Forge Nano’s technology, the days of nano-material coatings being too slow and expensive are behind us. Whatever your precision nano-coating needs, Forge Nano has the solutions to enable fast, affordable atomic level coatings and surface engineering. Our powder-on-demand system applies the principles of lean manufacturing to produce nano-coated particles – minimizing costs and maximizing potential.

With high throughput manufacturing capabilities at inexpensive price points, many technologies that were “put on the shelf” can now be reconsidered as viable commercial products. With major investments in application R&D, Forge Nano’s systems are well-poised to help usher a new wave of customized products to market.


The Benefits of Using Particle ALD

Atomic layer deposition (ALD), in its various forms, is a way of coating a substrate with a thin film using a layer-by-layer (LbL) bottom-up approach. Whilst many of the substrates are larger surfaces, such as electrodes, it is also possible to coat nanoparticles using this route. This is referred to as particle atomic layer...

An Introduction to Particle ALD

Particle ALD is the use of Atomic Layer Deposition to coat individual particles as small as sub-micron diameters. ALD provides conformal coatings on particles (making what are sometimes referred to as nano-M&M’s®). The first reported occurrence of this was documented in the 1960’s, but since deeper exploratory research from Finland throughout the 1990’s it...

Argonne National Laboratory’s Continuous ALD Technology Licensed Exclusively to Forge Nano

Method and System for Continuous Atomic Layer Deposition (ALD) on Powders and Moving Beds Strengthens Forge Nano’s Intellectual Property Rights Portfolio for their High Throughput Atomic Layer Deposition Technology LOUISVILLE, Colo… July 7, 2017 – Argonne National Laboratory has entered into an exclusive license agreement with Forge Nano to commercialize Argonne’s patented system and method...

The dawn of atomic-scale processing – The growing importance of atomic layer deposition and etching The dawn of atomic-scale processing – The growing importance of atomic layer deposition and etching A few weeks ago, the big news was that the research alliance of IBM, Global Foundries and Samsung unveiled the world’s first 5 nm chip as we could all read everywhere over the internet . Most notable was however the fact that...

What is Atomic Layer Deposition (ALD)?

Atomic layer deposition (ALD) is a vapor phase technique used to deposit thin films onto a substrate. The process of ALD involves the surface of a substrate being exposed to alternating precursors, which do not overlap but instead are introduced sequentially. In each alternate pulse, the precursor molecule reacts with the surface in a self-limiting...