THEIAR&D Scale Wafer Coating

R&D Scale Wafer Coating
THEIA combines the production-proven design and system components of our commercial solution, APOLLO, in an R&D package that delivers unmatched performance, flexibility, reliability and safety. THEIA is field upgradeable to accommodate the ever-changing needs of scientists and engineers, enabling a seamless transition from R&D to production. Recipes created with THEIA can be sent to APOLLO for a simple and straightforward path to commercial scale production of semiconductor wafer coating.

performance

Performance

THEIA delivers ultra-fast deposition with Forge Nano’s patented SMFD-ALD™ in a low-cost system for R&D budgets. Sub-second ALD cycle times allow efficient and rapid exploration of applications requiring thick films. Easily coating challenging patterned substrates, such as advanced-generation DRAM device wafers, membranes, sensors, electron multipliers, etc., with aspect ratios up to 1,000.

THEIA is a low-cost and versatile ALD system that fits most R&D budgets. Its flexible chamber design allows for a range of substrate sizes and types. The substrate platform accommodates round substrates, up to a 200 mm, fitting semiconductor wafers or a square carrying tray that holds multiple panels or randomly shaped parts and devices.

Capabilities

  • Fast and thick film deposition (>5 micron)
  • Fast ALD deposition at low temperatures
  • Low temperature processing (down to 80 °C)
  • Seamless incorporation of nano-laminates with reproducible atomic-layer control
  • Composite ternary and quaternary alloy films with no throughput penalty
  • In situ QCM monitoring of film growth with high mass and time resolution
  • Field reconfigurable

Specifications

  • Temperature Window: 50 – 500 °C
  • Liquid Chemical Inlets: Up to 6
  • Gaseous Chemical Inlets: Up to 4
  • Footprint: 60″ L x 32″ W x 76″ H
  • Capacity: Up to 200mm wafers
  • 5mm height clearance for coupons and objects
  • Substrate Handling: Manual single wafer loading

Ultra Fast Deposition with Forge Nano’s Patented SMFD-ALD™

Chemistries:

Al2O3, SiO2, AZO, TiO2, GaN, TiN, Bi2O3, Pt, Co, Cu, Ta2O5, Hf2O3, MLD

THEIA is ideal for exploration of newly developed ALD precursors. At the initial stage, ALD precursors are often extremely expensive ($1,000/gm is not unusual) and are available in very small quantities. Users also benefit from the many mature high productivity ALD processes that include HfO2, ZrO2, Ta2O5 SiO2, <300°C TiN, BN, GaN, Nb3N5 and more, available as turn-key processes from Forge Nano. Covering challenging patterned substrates such as advanced-generation DRAM device wafers, membranes, sensors, electron multipliers, etc. with up to 1,000 X enhanced area.

Applications:

Copper Barrier, ALD-Cap, Optical, Adhesion/Seeding, TCOs

Design:

THEIA is the only R&D tool for ALD that delivers blazing fast deposition compatible with large-scale production. With Forge Nano’s patented SMFD-ALD™, new powerful capabilities are finally available in a low cost system that fits most R&D budgets. Sub-second ALD cycle times allow efficient and rapid exploration of applications requiring thick films. Proprietary sources and processes enable new applications with unprecedented reproducibility and control. Film growth is monitored with better than 5% of monolayer resolution with an integrated QCM for finer process exploration and optimization and the finest growth details. THEIA allows you to unleash the full potential of atomic layer deposition.

Add Ons:

Ozone Generator, QCM, Plasma

Download our brochure for more information, or contact us to speak to a surface engineering expert.